Key Laboratory of Microorganism Application and Risk Control of Shenzhen, Shenzhen Key Laboratory ofEcological Remediation and Carbon Sequestration, Tsinghua Shenzhen International Graduate School
Central & Southern China Municipal Engineering Design and Research InstituteCo., Ltd.
Shenzhen Changlong Technology Co., Ltd.
Waterworks Construction Management Centre, Shenzhen Pingshan District WaterAffairs Bureau

为推动废水处理行业的绿色低碳转型,精确核算废水处理工艺的碳排放至关重要,其中电力消耗是主要的碳排放源。采用国际气候变化专门委员会推荐的排放因子法,对典型芯片废水处理工艺的碳排放进行了核算,并探讨了不同处理阶段的碳排放组成及其决定因素。结果表明,芯片废水处理工艺的碳排放量普遍高于城镇废水处理工艺。7种典型芯片废水处理工艺A~G的碳排放强度分别为2.20、2.32、2.85、2.58、2.72、3.69、2.39kgCO2e/m3。其中,在碳排放强度差异较小的情况下,G工艺的碳排放量最低,仅为1.2×104kgCO2e/d,直接甲烷、氧化亚氮、间接电耗和药耗排放量分别为3309.3、2893.8、3733.4和2520.7kgCO2e/d,间接电耗占比最高,达30%。相比之下,G工艺平均减排10%,最高达35%。以广东省某电子工业企业5200m3/d芯片废水处理工程为例,G工艺旨在有效应对氟化物及有机碳/氮处理挑战及碳排放控制问题,确保出水水质符合《地表水环境质量标准》(GB3838—2002)Ⅲ类标准。此外,A、G工艺单位用地碳排放强度分别为0.71kgCO2e/m2、1.93kgCO2e/m2,G工艺土地利用率和污水处理效率高。通过深入探究与分析后得出的结果,应用新的能源利用模式和工艺优化方法,在处理芯片废水的过程中,能够显著减少能源消耗,从而降低碳排放,有助于推动该行业朝着更加绿色、可持续的方向发展。

To effectively promote the green and low-carbon transformation of the wastewatertreatment industry, accurately calculating carbon emissions from wastewater treatment processes iscrucial. Electricity consumption constitutes the primary source of these emissions. During thewastewater treatment procedures, various electrical devices and equipment are used, including pumpsfor water circulation, aeration devices for oxygen supply, and monitoring instruments. All of theseconsume a significant amount of electricity, leading to substantial carbon emissions. This study adoptedthe emission factor method recommended by the Intergovernmental Panel on Climate Change (IPCC) tocalculate carbon emissions from typical chip wastewater treatment processes and explored thecomposition of carbon emissions at different treatment stages along with their influencing factors. Theresults showed that the carbon emissions of chip wastewater treatment processes are generally higherthan those from municipal wastewater treatment processes. The carbon emission intensities of seventypical chip wastewater treatment processes (A to G) were 2.20, 2.32, 2.85, 2.58, 2.72, 3.69, and 2.39 kgCOe/m, respectively. Among these, process G had the lowest carbon emissions of 1.2×10 kg COe/d,with relatively small differences in carbon emission intensity. Its direct methane, nitrous oxide, indirectelectricity consumption, and chemical consumption emissions were 3 309.3, 2 893.8, 3 733.4, and2 520.7 kg COe/d, respectively, with indirect electricity consumption accounting for the highestproportion at 30%. In comparison, process G achieved an average reduction of 10%, with a maximumreduction reaching 35%. Taking the 5 200 m/d chip wastewater treatment project from an electronicscompany in Guangdong Province as an example, process G aims to effectively address the challenges offluoride and organic carbon/nitrogen treatment, as well as carbon emission control, ensuring that theeffluent water quality meets the Class Ⅲ standard of the Surface Water Environmental Quality Standard(GB 3838—2002). In addition, the carbon emission intensities per unit of land for process A and G are0.71 kg COe/m and 1.93 kg COe/m, respectively, and process G has a high land utilization rate andefficient wastewater treatment. The study′s findings suggest that through in-depth investigation andanalysis, the application of new energy utilization models and process optimization methods in thetreatment of chip wastewater can significantly reduce energy consumption and carbon emissions,promoting the development of the industry in a greener and more sustainable direction.

深圳市科技计划资助项目(KCXST20221021111201004)

梁杏媚,刘可,蔡振山,等.半导体芯片废水高标准处理工艺碳排放与效能特征[J].能源环境保护,2025,39(1):145−153.

LIANG Xingmei, LIU Ke, CAI Zhenshan, et al. Carbon Emissions and Efficiency Characteristics of High-standard Treatment Processes for Semiconductor Chip Wastewater[J]. Energy Environmental Protection,2025, 39(1): 145−153.