1.School of Power Engineering, Chongqing University, Chongqing , China; 2.State Key Lab of Gas Disaster Monitoring, Preventing and Emergency Technology, Chongqing , China; 3.Chongqing Research Institute, China Coal Technology and Engineering Group, Chongqing , China

基于煤矿瓦斯减排要求及超低浓度瓦斯蓄热氧化利用技术的应用现状，介绍了超低浓度瓦斯蓄热氧化利用技术的工作原理，梳理了超低浓度瓦斯蓄热氧化技术从借鉴有机化合物处理经验开始至数学模型优化指导工业化设计的发展历程，并对国内外主要研究方向及研究进展进行了阐述，包括惰性蓄热填料通道内反应动力学机理、燃烧反应热波移动规律、数值模拟及验证、氮氧化物排放及大尺度试验研究等方面。对超低浓度瓦斯蓄热氧化利用技术研究过程中存在的矛盾之处，如简化反应机理、反应产物及动力学参数等方面进行了探讨，并分析和预测了超低浓度瓦斯蓄热氧化利用技术研究的趋势。对该技术领域的科学研究、数值模拟计算、设计优化及工程应用等具有一定的指导意义。

Based on the mine gas emission reduction requirements and the application status of the thermal oxidized utilization technology with the ultra low concentration gas, the paper introduced the working principle of the thermal oxidization utilization technology with the ultra low concentration gas. The thermal oxidized technology with the ultra low concentration gas was prepared in references of the VOC processing experience to the development course of the industrialized design guided by the mathematical model optimization. A statement was conducted on the principal study orientation and study progress at home and abroad, including the reaction kinetics mechanism of the inert thermal fillings in the gateway, the thermal wave migration law of the combustion reaction, numerical simulation and approval, nitrogen oxide emission and large dimension experiment study and other aspects. A discussion was conducted on the contradictions, such as the simplified reaction mechanism, reaction products, dynamics parameters and other aspects existed in the process of the study on the thermal oxidized utilization technology of the ultra low concentration gas. Meanwhile, an analysis and prediction were conducted on the study tendency on the thermal oxidized utilization technology of the ultra low concentration gas. The technology would have necessary guidance significances to the science study, numerical simulation calculation, design optimization and engineering application as well as others in the technical filed.